Chinese scientists have built a working prototype of an extreme ultraviolet lithography machine in a high-security Shenzhen laboratory, a development that represents exactly what Washington has spent years and multiple rounds of export controls trying to prevent: China's path toward semiconductor independence and an end to the West's monopoly on the technology that powers AI, smartphones and advanced weapons systems.
The prototype, completed in early 2025 by former ASML engineers who reverse-engineered the Dutch company's machines, is operational and generating EUV light, though it has not yet produced working chips. The effort is part of a six-year secret government initiative that sources described to Reuters as China's version of the Manhattan Project.
Huawei is coordinating thousands of engineers across companies and state research institutes, and recruits are working under false identities inside secure facilities. The Chinese government is targeting 2028 for producing working chips, though sources say 2030 is more realistic -- still years earlier than the decade analysts had predicted it would take China to match the West.
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