GoKawiilResearchers develop electroluminescent photoresists enabling nanoscale OLED patterning
Scientists synthesized thermally activated delayed fluorescence (TADF) block copolymers using atom transfer radical polymerization, first removing bromo end groups through hydrogenation and then building crosslinkable electroluminescent photoresists (ELPRs) from these polymers as macroinitiators. By adjusting the ratio of crosslinkable monomer to macroinitiator, the team controlled crosslinker density in the final light-emitting polymer material.
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This approach could let manufacturers pattern OLED pixels directly using lithographic techniques rather than shadow masks, potentially enabling much higher pixel densities for displays. Combining light-emitting function with photoresist properties in a single material simplifies fabrication and could accelerate development of high-resolution microdisplays for AR/VR devices.
- TADF polymers were chemically modified to remove reactive bromo end groups via hydrogenation
- Block copolymerization created electroluminescent photoresists with tunable crosslinker content
- The method could enable finer, lithography-based patterning for next-generation OLED displays
Source: nature.com — Lo, 2026-09-16
Published there as: “Electroluminescent photoresists extending lithographic scaling to OLEDs”
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