Published on: 2025-07-06 17:55:11
LEUVEN (Belgium), February 24, 2025— This week at SPIE Advanced Lithography + Patterning, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, presents the first electrical test (e-test) results obtained on 20nm pitch metal line structures patterned after single-exposure High NA EUV lithography. Measurements on both serpentine and fork-fork metallized structures show good electrical yield, indicative of a low number of stochastic defects. The e-test resu
Keywords: euv high na patterning structures
Find related items on AmazonGo K’awiil is a project by nerdhub.co that curates technology news from a variety of trusted sources. We built this site because, although news aggregation is incredibly useful, many platforms are cluttered with intrusive ads and heavy JavaScript that can make mobile browsing a hassle. By hand-selecting our favorite tech news outlets, we’ve created a cleaner, more mobile-friendly experience.
Your privacy is important to us. Go K’awiil does not use analytics tools such as Facebook Pixel or Google Analytics. The only tracking occurs through affiliate links to amazon.com, which are tagged with our Amazon affiliate code, helping us earn a small commission.
We are not currently offering ad space. However, if you’re interested in advertising with us, please get in touch at [email protected] and we’ll be happy to review your submission.