GoKawiilPhysicist Ronald Koopman appeared at a Southern California Air District meeting in 2018 to talk about what seemed like an arcane scientific topic: hydrofluoric acid dispersion and water mitigation testing.
Hydrofluoric acid, also known as hydrogen fluoride or HF, is used to manufacture a range of materials, including refrigerants, gasoline, fluorine-based pesticides and fluoropolymers like those used to make Teflon. It’s also one of the most corrosive and dangerous chemicals known. Koopman conducted experiments with the chemical in the 1980s that warned about the potential of deadly accidents at facilities that use the hazardous materials.
With the Trump administration poised to roll back rules intended to protect workers and communities from catastrophic industrial chemical releases, and a new analysis showing rising rates of chemical accidents, Koopman’s presentation on highly hazardous materials has taken on a new urgency.
The number of accidents involving releases of dangerous chemicals rose by 57 percent between 2021 and 2025, from 83 to 131, according to an analysis released Monday by Public Employees for Environmental Responsibility, a nonprofit that works with former government officials.
Injuries or deaths from accidents also rose, from 60 to 89 over the same five-year period, the analysis found. Incident reports released by the Chemical Safety Board (CSB), an independent agency that investigates chemical accidents, show that more than 650 accidents occurred between April 2020 and May 2026, with 103 resulting in fatalities, 355 causing injuries and 314 doing “substantial property damage.”
Close to 150 million people live within 3 miles of these facilities. Historically underserved and overburdened populations, including people who identify as Black and Latino, are at greatest risk of exposure to an accidental release.
Many refineries were built before 1985, the analysis notes. “With each passing year the risk gets greater because the infrastructure continues to age,” said Jeff Ruch, senior counsel at PEER.