GoKawiilNvidia's Jensen Huang predicts China will build advanced lithography tools by 2030
Nvidia CEO Jensen Huang said in an All-In Podcast interview that China will develop its own advanced lithography machines, comparable to those made by ASML, within the next three to four years. He argued China's manufacturing strength makes such a timeline achievable, despite the country's current reliance on older-generation tools from Shanghai Micro Electronics Equipment that support only 90nm and possibly 28nm-class chipmaking.
GoKawiil's interpretation of the reporting above, not reported fact.
Lithography remains the biggest bottleneck for China's chip independence, since ASML's export-controlled EUV systems are essential for cutting-edge semiconductor production. Huang's optimistic timeline contrasts with the technical reality that China's most advanced domestic scanners still lack proven high-volume qualification, meaning his forecast may overstate how quickly Beijing can close the gap with global leaders.
- Jensen Huang predicts China will have advanced lithography tools by 2030.
- China's current leading tool, from SMEE, only supports 90nm-class chips in volume production.
- A newer 28nm-capable immersion scanner reportedly exists but isn't yet proven for mass manufacturing.
Source: tomshardware.com — Anton Shilov, 2026-09-16
Published there as: “Jensen Huang thinks China will develop its own advanced lithography chipmaking tools by 2030 — Nvidia CEO says achievement of that capability 'is just a matter of time'”
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