Published on: 2025-05-08 10:40:37
The sandworms of Arrakis might have found a new plaything. Robert Pattinson, fresh off his turn in Bong Joon Ho’s cloning film Mickey 17, may be joining the cast of the final entry in Denis Villeneuve’s Dune trilogy. Deadline reports that Pattinson is a high priority for Legendary to join the cast of the film, although no formal offer for any role, undisclosed or otherwise, has been made yet. Villeneuve’s script for the film, an adaptation of the events of Dune Messiah, is still being finalized
Keywords: batman dune film pattinson villeneuve
Find related items on AmazonPublished on: 2025-06-03 16:35:41
S emiconductor chips are among the smallest and most detailed objects humans can manufacture. Shrinking the scale and upping the complexity is a fight against the limits of physics, and optical lithography—etching nanometre-scale patterns onto silicon with short-wavelength light—is its most extreme frontier. ASML , a Dutch firm that builds such lithography tools, takes an almost sci-fi approach by blasting molten tin droplets with lasers in a vacuum to produce extreme ultraviolet ( EUV ) light w
Keywords: euv extreme light lithography wavelength
Find related items on AmazonPublished on: 2025-07-02 05:09:41
We are all made of star stuff, as astronomer Carl Sagan was fond of reminding us. Supernova explosions, the catastrophic self-destruction of certain types of worn-out stars, are intimately tied to life on Earth because they are the birthplaces of heavy elements across the universe. Most of the iron in our blood and the sulfur in our amino acids originated in stars that detonated billions of years ago. But we have encountered another, quite surprising connection between supernovas and the human w
Keywords: euv hydrogen light plasma tin
Find related items on AmazonPublished on: 2025-07-06 17:55:11
LEUVEN (Belgium), February 24, 2025— This week at SPIE Advanced Lithography + Patterning, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, presents the first electrical test (e-test) results obtained on 20nm pitch metal line structures patterned after single-exposure High NA EUV lithography. Measurements on both serpentine and fork-fork metallized structures show good electrical yield, indicative of a low number of stochastic defects. The e-test resu
Keywords: euv high na patterning structures
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