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61.
Chinese fabs are reportedly upgrading older ASML DUV lithography chipmaking machines — secondary channels and independent engineers used to soup up Twinscan NXT series (tomshardware.com)
62.
Surprising biomedical application found for ASML’s chipmaking EUV lithography machines — they can mass produce nanopores for molecular sensing (tomshardware.com)
63.
China may have reverse engineered EUV lithography tool in covert lab, report claims — employees given fake IDs to avoid secret project being detected, prototypes expected in 2028 (tomshardware.com)
64.
Intel installs industry's first commercial High-NA EUV lithography tool — ASML Twinscan EXE:5200B sets the stage for 14A (tomshardware.com)
65.
New 1.4nm nanoimprint lithography template could reduce the need for EUV steps in advanced process nodes — questions linger as no foundry has yet committed to nanoimprint lithography for high-volume manufacturing (tomshardware.com)
66.
U.S government awards Gelsinger-backed EUV developer xLight with $150 million in federal incentives — company to develop new electron-based light source for lithography tools (tomshardware.com)
67.
Chinese scientists discover method to cut defects by 99% with DUV chipmaking equipment, but it destroys EUV pattern fidelity — analyzing photoresist clustering with cryo-ET at 105°C (tomshardware.com)
68.
American startup Substrate promises 2nm-class chipmaking with particle accelerators, at a tenth of the cost of EUV — X-ray lithography system has potential to surpass ASML's EUV scanners (tomshardware.com)
69.
Chips, AI, and Geopolitics: Inside ASML’s Surprising Mistral Investment (techreport.com)
70.
Startup aims to shrink particle accelerators to transform semiconductor manufacturing (techspot.com)
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