GoKawiilChinese startup Langdao Silex unveils prototype EUV light source
Langdao Silex, founded in 2024 by alumni of Tsinghua University's Gas Discharge Plasma Laboratory, showed off a prototype laser-produced plasma EUV light source called FlintNano LPP-OXXO at a Shanghai trade fair. The unit reportedly outputs over 15W with 90% domestically sourced components and can run continuously for more than 100 hours, but TrendForce reports commercialization is still three to five years away.
GoKawiil's interpretation of the reporting above, not reported fact.
A light source is only one piece of a full EUV lithography scanner, so this milestone does not mean China is close to replicating ASML's machines, which also require advanced optics, collection systems and precision stages. The demonstration nonetheless signals continued Chinese investment in domestic EUV capability amid export restrictions, and such claims have surfaced before without quickly translating into production-ready tools.
- Langdao Silex demoed an EUV light source prototype with over 15W output and 90% local components.
- The company says commercialization could take three to five more years, per TrendForce.
- A usable light source alone does not constitute a complete EUV lithography scanner.
Source: tomshardware.com — Anton Shilov, 2026-10-16
Published there as: “China startup demoes prototype EUV light source”
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