Morphotonics, a Netherlands-based nanoimprint lithography company that makes waveguide displays for AR glasses, has raised €40 million to scale production and expand into optical components for data centers. The round included 3M Ventures, Innovation Industries, BOM, Invest-NL, the European Innovation Council Fund, a Dutch family office, and the European Investment Bank. The funding extends a round that began in 2024 as the company rides growing demand for smart glasses displays.
techcrunch.com
· 2026-09-22
According to a JPMorgan note cited by Semi Doped, ASML has no plans to adopt free-electron laser (FEL) technology for extreme ultraviolet lithography, despite backing from Elon Musk for that approach. Instead, ASML is continuing to refine its existing laser-produced plasma (LPP) method, aiming to boost source power from around 500W to 1,000W and nearly double the rate of tin droplet generation to 100,000 per second.
tomshardware.com
· 2026-09-18
Nvidia CEO Jensen Huang said in an All-In Podcast interview that China will develop its own advanced lithography machines, comparable to those made by ASML, within the next three to four years. He argued China's manufacturing strength makes such a timeline achievable, despite the country's current reliance on older-generation tools from Shanghai Micro Electronics Equipment that support only 90nm and possibly 28nm-class chipmaking.
tomshardware.com
· 2026-09-16
Dutch companies LeydenJar and Powall are not manufacturing complete batteries but specializing in critical components, such as battery anodes, aiming to secure a strategic foothold in the global battery supply chain. LeydenJar's Christian Rood likens this approach to ASML's dominance in semiconductor equipment, where being indispensable in one production step grants outsized influence over an entire industry.
bbc.co.uk
· 2026-09-10
ASML has partnered with Intel, Samsung, and TSMC to accelerate industry adoption of larger 6×12-inch photomasks, a change needed to fully exploit High-NA EUV lithography. The larger reticle size would let chipmakers print large dies in a single exposure rather than stitching together smaller patterned sections, addressing a field-size limitation created by High-NA's anamorphic optics.
tomshardware.com
· 2026-09-10
ASML is developing a larger 12-inch mask format for its next-generation High-NA EUV lithography systems, letting them print chips as large as those made with current EUV tools. The company expects a pilot line by 2031 and high-volume production by 2033, with CTO Marco Pieters saying the shift could boost system productivity by 40% if the industry adopts it together.
techspot.com
· 2026-09-09
Samsung Electronics and TSMC have committed to deploying ASML's newest high-numerical-aperture EUV lithography systems, machines that can cost up to $400 million each. Both companies join Intel in adopting a related technical change expected to increase chip output on these machines by roughly 40 percent. Samsung plans to use the tools for memory chip production by 2028, while TSMC intends to apply the technology to its most advanced chips for customers like AMD, Apple, Nvidia and Qualcomm.
arstechnica.com
· 2026-09-08
Intel shares surged 9% Tuesday, pushing above the $95 level from its recent equity offering, after reports that the company plans to raise CPU prices in October and news that its foundry business is advancing High NA EUV lithography with over 1 million wafers processed. CNBC's Jim Cramer included Intel among his six top stock picks, while comments from President Trump over the weekend eased worries that the government might soon sell its 10% stake in the company.
cnbc.com
· 2026-09-08
ASML announced that Samsung and TSMC will follow Intel in adopting its High NA extreme ultraviolet lithography systems, with Samsung targeting DRAM production by 2028 and TSMC planning advanced node use by 2030. The three chipmakers also launched a joint effort to shift from six-inch to 12-inch photomasks, a change expected to reach advanced production by 2033.
engadget.com
· 2026-09-08
Samsung and TSMC, the world's two largest chipmakers, have confirmed plans to deploy ASML's High NA extreme ultraviolet lithography systems, machines that can cost roughly $400 million each and etch finer circuit patterns onto silicon wafers. Samsung plans to use the tools for DRAM production starting in 2028 and expand its scaling roadmap by 2030, while TSMC expects broader adoption driven by increasingly complex transistor designs needed for AI chips. Both companies join Intel as customers of the technology.
cnbc.com
· 2026-09-08
Intel says it has run more than one million 300-mm wafers through its High-NA EUV scanners since assembling its first tool roughly two and a half years ago. The company is currently using these tools, including EXE:5000 and EXE:5200B systems, to produce Panther Lake chips on its 18A process, while also developing larger 6x12-inch photomasks that would let High-NA tools expose full-size chip fields without needing to stitch two half-fields together.
tomshardware.com
· 2026-09-08
French AI startup Mistral AI has closed a funding round of $3.48 billion, drawing from both existing backers like Samsung and ASML Holding and new investors. The round pushes the company's valuation above $24 billion, cementing its status as Europe's leading AI challenger to US and Chinese rivals.
wsj.com
· 2026-09-08
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