ASML rejects free-electron laser approach for EUV, sticks with plasma light sources

According to a JPMorgan note cited by Semi Doped, ASML has no plans to adopt free-electron laser (FEL) technology for extreme ultraviolet lithography, despite backing from Elon Musk for that approach. Instead, ASML is continuing to refine its existing laser-produced plasma (LPP) method, aiming to boost source power from around 500W to 1,000W and nearly double the rate of tin droplet generation to 100,000 per second.